Advanced modern day semiconductor manufacturing is heavily reliant on the reduction of feature sizes in order to pack more processing power into each chip. In order to create these small features, ASML’s cutting edge photolithography machines make use of Extreme Ultraviolet light (EUV) in order to produce chips with feature sizes on the order of 3 nanometers. Implementation of real-time optimization deals with the high sensitivity of the machine to the environment, making traditional control structures ineffective. Our project, Lithoptimize seeks to improve the efficiency of these photolithography machines by introducing advanced control algorithms that will help to increase both the quality and quantity of EUV produced by these machines.